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Simplified process flow for the fabrication of silicon photonics devices on a 4inch SOI substrate for datacome application (wAvelenght 1500 nm) employing a spacer technology that allowed fabrication of sub-micron silicon WGs starting from conventional near-UV micrometric photolithography.

SIMPLIFIED PROCESS FLOW

 

OPTICAL IMAGES

Optical images of sub-micrometric silicon nitrede hard mask

 

 SEM IMAGES

Silicon WGs (right) and resonator ring coupler after silicon device layer RIE etching

 

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