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ION IMPLANTATION PROCESSES
PROCESS | IMPLANTED SPECIES | ENERGY RANGE | TEMPERATURE |
MEDIUM ENERGY | B, N, O, Si, P, Ar, As, In, Sb | 15-170 keV | R.T. - 550°C |
HIGH ENERGY | H, He, B, N, O, Al, Si, P, As | 500 KeV - 5 MeV | -60 - 700 °C |
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