-A A +A

ION IMPLANTATION PROCESSES

PROCESS IMPLANTED SPECIES ENERGY RANGE TEMPERATURE
MEDIUM ENERGY B, N, O, Si, P, Ar, As, In, Sb 15-170 keV R.T. - 550°C
HIGH ENERGY H, He, B, N, O, Al, Si, P, As 500 KeV - 5 MeV -60 - 700 °C

 

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CONTACT PERSON: FULVIO MANCARELLA